TMM3 at the Marrakech Biennale 2016

A brief report on the presentation and workshop: 22 — 27 February 2016

22 Feb 2016
27 Feb 2016

A student workshop with the masters students of ESAV Marrakech and a project presentation/exhibition was a way to present the project in progress, to an international and Moroccan audience, to test the fonts, and to share the design process.

TMM3_ESAV Marrakech_ Silkscreen Printing - Jan de Bruin

1) The typographic design workshop with the students resulted in discussions of the typefaces and ways to works with them to create expressive and poetic compositions. The 12 selected compositions were also tested at different sizes, a small size for a series of A5 postcards, and a larger size for application to tote bags.

2) After three days, we had the challenge of silkscreen printing the typographic designs to paper for the postcards and to fabric for the tote bags. We worked for two intense days and late nights, with the help of extra volunteer first year students, to produce a small series of 12 cards and 3 tote bag designs in 4 colors. The process was labor intensive but it was also a pleasure to work with such dedicated young people.

3)The workshop was concluded with a morning public presentation on Saturday 27 February at ESAV, followed by the opening of the documentary photography exhibition of Jan de Bruin. The exhibition gave the human angle of the project in a beautifully displayed visual narrative, in the ground floor gallery of the art school. And the public lecture/presentation was delivered in the auditorium by the two curators of the project Huda Smitshuijzen AbiFares and Brahim Boucheikha (in French). This event was attended by some 150 people, ranging from art and design students (from Marrakech, Casablanca, and Tetouan), some former graduate students of ESAV, some professional researchers, designers and visual artists from Rabat, Casablanca, Belgium, France and the Netherlands. The mix and the questions raised and discussed after the lecture were both informative and encouraging.

We would like to thank our hosts (ESAV and the Marrakech Biennale 6 team), the ESAV students, and the participating public for making our week in Marrakech and yet again, such a pleasurable and highly inspiring experience.